Toshiba Starts Shipping Test Samples of 1200V Trench-Gate SiC MOSFET that will Enhance Efficiency in Next-Generation AI Data Centers

1 hour ago 3
 TW007D120E, a 1200V trench-gate SiC MOSFET.Toshiba: TW007D120E, a 1200V trench-gate SiC MOSFET. Business Wire

Article content

KAWASAKI, Japan — Toshiba Electronic Devices & Storage Corporation (“Toshiba”) today started shipping test samples of “TW007D120E,” a 1200V trench-gate SiC MOSFET primarily intended for power supply systems in next-generation AI data centers that is also suitable for use in renewable energy-related equipment.

Financial Post

THIS CONTENT IS RESERVED FOR SUBSCRIBERS ONLY

Subscribe now to read the latest news in your city and across Canada.

  • Exclusive articles from Barbara Shecter, Joe O'Connor, Gabriel Friedman, and others.
  • Daily content from Financial Times, the world's leading global business publication.
  • Unlimited online access to read articles from Financial Post, National Post and 15 news sites across Canada with one account.
  • National Post ePaper, an electronic replica of the print edition to view on any device, share and comment on.
  • Daily puzzles, including the New York Times Crossword.

SUBSCRIBE TO UNLOCK MORE ARTICLES

Subscribe now to read the latest news in your city and across Canada.

  • Exclusive articles from Barbara Shecter, Joe O'Connor, Gabriel Friedman and others.
  • Daily content from Financial Times, the world's leading global business publication.
  • Unlimited online access to read articles from Financial Post, National Post and 15 news sites across Canada with one account.
  • National Post ePaper, an electronic replica of the print edition to view on any device, share and comment on.
  • Daily puzzles, including the New York Times Crossword.

REGISTER / SIGN IN TO UNLOCK MORE ARTICLES

Create an account or sign in to continue with your reading experience.

  • Access articles from across Canada with one account.
  • Share your thoughts and join the conversation in the comments.
  • Enjoy additional articles per month.
  • Get email updates from your favourite authors.

THIS ARTICLE IS FREE TO READ REGISTER TO UNLOCK.

Create an account or sign in to continue with your reading experience.

  • Access articles from across Canada with one account
  • Share your thoughts and join the conversation in the comments
  • Enjoy additional articles per month
  • Get email updates from your favourite authors

Sign In or Create an Account

or

Article content

With the rapid expansion of generative AI, increasing power consumption has become a pressing issue for data centers. In particular, the widespread adoption of high-power AI servers and the growing deployment of 800V high-voltage direct current (HVDC) architectures are driving demand for power supply systems with higher power conversion efficiency and power density. Toshiba has addressed these requirements for next-generation AI data centers by developing TW007D120E, which will contribute to lower power consumption and to the miniaturization and higher efficiency of power supply systems.

Article content

Article content

Article content

TW007D120E is built around Toshiba’s proprietary trench-gate structure[1], which achieves industry-leading[2] low On-resistance per unit area (RDS(on)A); it reduces conduction loss through lower On-resistance while simultaneously achieving lower switching loss. Compared with Toshiba’s current products, TW007D120E reduces RDS(on)A by approximately 58%[3] and improves the figure of merit, On-resistance × gate-drain charge (RDS(on) × Qgd), which represents the trade-off between conduction loss and switching loss, by approximately 52%[3]. These characteristics will help to realize highly efficient operation and reduced heat generation in data center power supply systems and contribute to improved overall system efficiency.

Article content

By signing up you consent to receive the above newsletter from Postmedia Network Inc.

Article content

The new product is housed in a QDPAK package that supports top-side cooling. This contributes to both higher power density implementation and enhanced thermal performance in the power stage, which are essential for power conversion in next-generation AI data centers.

Article content

Toshiba will prepare for mass production of TW007D120E during fiscal year 2026 and will continue to expand its lineup, including development for automotive applications. Through the trench-gate SiC MOSFET, the company will contribute to improved power efficiency and reduced CO₂ emissions in data centers and a wide range of industrial equipment, supporting the realization of a decarbonized society.

Article content

TW007D120E is based on results obtained from JPNP21029, a project subsidized by the New Energy and Industrial Technology Development Organization (NEDO).

Article content

Notes:
[1] A device structure in which fine trenches are formed in the semiconductor substrate and gate electrodes are embedded within the trenches.
[2] Toshiba research, as of May 2026.
[3] Comparison of the newly developed 1200V SiC MOSFET with Toshiba’s 3rd-generation SiC MOSFET (TW015Z120C). Toshiba research, as of May 2026.

Article content

Applications

Article content

  • Power supplies for data centers (AC-DC, DC-DC)
  • Photovoltaic inverters
  • Uninterruptible power supply (UPS)
  • EV charging stations
  • Energy storage systems
  • Industrial motors

Article content

Features

Article content

  • Low On-resistance and low RDS(on)A
  • Low switching loss and low RDS(on) × Qgd
  • Low gate drive voltage: VGS_ON=15V to 18V
  • High thermal performance QDPAK package

Article content

Main Specifications

Article content

(Unless otherwise specified, Tvj=25°C)

Part number

TW007D120E

Package

Name

QDPAK

Absolute maximum ratings

Drain-source voltage VDSS (V)

1200

Drain current (DC) ID (A)

Tc=25°C

172

Electrical characteristics

Drain-source On-resistance RDS(on) (mΩ)

VGS=15V

Typ.

7.0

Gate threshold voltage Vth (V)

VDS=10V

3.0 to 5.0

Total gate charge Qg (nC)

VGS=15V

Typ.

317

Gate-drain charge Qgd (nC)

VGS=15V

Typ.

33

Input capacitance Ciss (pF)

VDS=800V

Typ.

13972

Diode forward voltage VSD (V)

VGS=0V

Typ.

3.2

Note: Specifications and schedules for products under development are subject to change without notice.

Article content

Article content

Follow the link below for more on Toshiba’s SiC Power Devices.

Article content

Article content

* Company names, product names, and service names may be trademarks of their respective companies.
* Information in this document, including product prices and specifications, content of services and contact information, is current on the date of the announcement but is subject to change without prior notice.

Article content

About Toshiba Electronic Devices & Storage Corporation

Article content

Toshiba Electronic Devices & Storage Corporation, a leading supplier of advanced semiconductor and storage solutions, draws on over half a century of experience and innovation to offer customers and business partners outstanding discrete semiconductors, system LSIs and HDD products.

Article content

Its 17,400 employees around the world share a determination to maximize product value, and to promote close collaboration with customers in the co-creation of value and new markets. The company looks forward to building and to contributing to a better future for people everywhere.

Article content

Article content

Article content

Article content

View source version on businesswire.com:

Article content

Article content

logo

Article content

Contacts

Article content

Customer Inquiries:

Article content

Article content

Power & Small Signal Device Sales & Marketing Dept.

Article content

Article content

Tel: +81-44-548-2216

Article content

Article content

Article content

Media Inquiries:

Article content

Article content

C. Nagasawa

Article content

Article content

Communications & Market Intelligence Dept.

Article content

Article content

Toshiba Electronic Devices & Storage Corporation

Article content

Article content

Article content

Read Entire Article